 |
 |
| Polishing Films |

High precision finish
Versatile base film with excellent resistance to both water and oil
Enable to use automated polishing equipments

Micromotors and Commutators Hard disks
LCD panels and Color filters Fiber optic connectors
Magntic heads Semiconductor substrates |
|

Abrasive materials:
[GC](SiC)Green silicon carbide / [WA](Al2O3)White aluminum oxide / [K](Cr2O3)Chrome oxide / [ROI](Fe2O3)Iron oxide
[D](C)Diamond / [CE](CeO2)Cerium oxide / [SO(SI)](SiO2)Silicon oxide
Base film thickness
[PET]75μm(3mil) / 50μm(2mil) / 25μm(1mil)
| Mesh |
New Mohs hadness scale |
FINAL |
20000 |
15000 |
10000 |
8000 |
6000 |
4000 |
3000 |
2000 |
1500 |
1200 |
1000 |
800 |
600 |
400 |
| μm |
|
|
0.2 |
0.3 |
0.5 |
1 |
2 |
3 |
5 |
9 |
12 |
15 |
16 |
20 |
30 |
40 |
| GC |
13 |
|
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
|
|
Ο |
Ο |
Ο |
Ο |
| WA |
12 |
|
Ο |
|
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
|
Ο |
Ο |
Ο |
Ο |
| K |
8 |
|
|
Ο |
Ο |
Ο |
|
|
|
|
|
|
|
|
|
|
| ROI |
7 |
|
|
Ο |
|
|
|
|
|
|
|
|
|
|
|
|
| D |
15 |
|
Ο |
|
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
|
Ο |
|
|
Ο |
|
| CE |
9 |
|
|
|
Ο |
Ο |
|
|
|
|
|
|
|
|
|
|
| SO(SI) |
8 |
Ο |
|
|
Ο |
|
|
|
|
|
|
|
|
|
|
|
|
Please contact us for some combinations of the components are not possible.
If you require base film thickness other than what is listed above, please consult us.
Besides polyseter base films, we offer various base films such as non-woven fiber, woven fiber, flocked pile, synthetic paper and so on.
Type
|
Size |
Base |
ID |
| Roll type |
|
3 inch
2 inch
1 inch
3/4 inch
1/2 inch
1/4 inch
1/7 inch
X 100M |
25μm
50μm
75μm |
3 inch
1 inch
Plastic core winding |
| Sheet type |
|
228mm X 280mm
(9 inch X 11 inch) |
75μm |
|
| Disk type |
|
76mmφ
110mmφ
127mmφ
203mmφ
|
75μm |
|
|
If you require sizes other than what listed below, please consult with us.
|
 |
| VARIOFILM |

Smooth and strong polyester films with uniform thickness
Uniform and stable polishing performances by abrasive particles coated by advanced statically charged coating technology
Special back coating is offerd for skid proof products

Crank shafts Cam shafts
OA equipment rubber rollers Printing rollers
Various metal shafts, etc. |
|

Abrasive materials
[WA](Al2O3)White aluminum oxide/ [CC](SiC)Silicon carbide
Base film thickness
[PET]125μm(5mil)
| Mesh |
FINAL |
4000 |
3000 |
2000 |
1500 |
1000 |
800 |
600 |
400 |
360 |
320 |
Back coating |
Base film thickness |
Applications |
| (μm) |
|
3 |
5 |
9 |
12 |
15 |
20 |
30 |
40 |
50 |
60 |
| WA |
|
|
|
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
Ο |
125μ |
5
mil |
Crank shafts, Cam shafts, Metal shafts |
| CC |
|
|
|
|
|
Ο |
Ο |
Ο |
Ο |
|
Ο |
Ο |
125μ |
5
mil |
Crank shafts, Rubber rollers |
| FINAL |
Ο |
|
|
|
|
|
|
|
|
|
|
Ο |
125μ |
5
mil |
Mirror finish polishing of metal shafts and rolls |
|
|
 |
| Polishing Slurry |

Reduced scratches by state of the art despersion technology
Controlled particle sizes by our proprietary classfication technology

Diamond slurry: Hard disks, Polishing of compound seniconductor such as sapphire waffers
Cerium slurry: Polishing of fiber optical end faces, removal of scratches from glass panels |
|

Abrasive materials
[D](C)Diamond / [CE](CeO2)Cerium oxide / (SiO2)Silicon oxide
| Mesh |
100000 |
80000 |
20000 |
10000 |
8000 |
4000 |
3000 |
1000 |
800 |
| (μm) |
0.02 |
0.03 |
0.12 |
0.5 |
1 |
3 |
6 |
20 |
30 |
| D |
Ο |
Ο |
Ο |
|
Ο |
Ο |
Ο |
Ο |
Ο |
| CE |
|
|
|
Ο |
|
|
|
|
|
| SiO2 |
Ο |
|
|
|
|
|
|
|
|
|
|
 |
| Polishing Pads |

Cobines high polish rate, high durability and produces excellent flatness and surface finish
Possible to create customized products based on yourplaten sizes

Semiconductor, compound semiconductor back pads and others
Finish polishing of semiconductor
Semiconductor 1st step polish(round polish)
CMP, compound semiconductor and so on
|
|

| Type |
Description |
Base film thickness |
Thickness(mm) |
Comparessibility(%) |
| Suede |
DSM-100 |
PET film |
0.55-0.60 |
10-35 |
DSM-500 |
Non woven |
1.20-0.40 |
5-15 |
| Smooth |
DSM-200 |
PET film |
0.40-0.60 |
2-5 |
| Non woven |
DSM-400 |
- |
1.20-1.40 |
3-10 |
| Non cell |
NCP |
- |
1.50 |
|
|
|
| Polishing Machine |

Enable to perform polishing without chemicals by using polishing tapes
Easy to achieve uniform polishing quality in a short time without clogging

Polishing of silicon wafer and compound semiconductor edge
Polishing of LCD panel and other substrates surfaces
Polishing of metal shafts and OA equipment rubber rollers, etc.
Polishing of quality assessment
|
|

| Name of device |
Photo |
Applications |
Polishing mechanism |
| Edge polisher |
|
Polishing of silicon wafer edge
Polishing of compound semiconductor edge |
|
| Panel cleaner |
 |
Polishing of foreign materials from the substrates of LCD panels
Polishing of other substrates surfaces |
|
| Micro finisher |
|
Polishing of metal shafts
Polishing of OA equipment rubber rollers, etc. |
|
| Tape lapping machine |
|
Polishing of quality assessment |
|
OSC polishing machine
|
|
Polishing of quality assessment
|
|
| Hoop material polisher (FPC polisher) |
|
Polishing of flexible printed wiring board (FPC) |
|
|
|

Shape |
Applications |
| Cylinders |
|
Crank shafts
Copy and facsimile rollers
Resin motors
Micromotors and commutators
Small scale shafts |
| Flat surfaces |
|
Substrates(Aluminum alloy, glass)
Stamper(Optical disk)
LCD panels, color filters
Plasma display panels
Multiple layer laminate substrates
Ceramics substrates
Video tapes |
| Curved surfaces |
 |
Magnetic heads
Video heads
Fiber optic connectors
Rocker arms
Rotary compressor valves
Glass and plastic lenses |
|
|
|